Cluster Tool for In Situ Processing and Comprehensive Characterization of Thin Films at High Temperatures
A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from −100 to 800 °C is described. The implemented techniques comprise magnetron sputtering, ion irradiation, Rutherford…
DOI: 10.1021/acs.analchem.8b00923