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Structural effects due to the incorporation of Ar atoms in the lattice of ZrO2 thin films prepared by ion beam assisted deposition

Abstract

Two sets of ZrO2 thin films have been prepared at room temperature by ion beam induced chemical vapour deposition and subsequently annealed up to 1323 K. The two sets of samples have been prepared by using either O2+ or mixtures of (O2++Ar+) ions for the decomposition of a volatile metallorganic precursor of zirconium. The structure and microstructure of these two sets of samples have been determined by means of X-ray diffraction, Fourier transform infrared spectroscopy and positron beam analysis (PBA). The samples were very compact and dense and had a very low-surface roughness. After annealing in air at T⩾573 K both sets of films were transparent and showed similar refraction indexes. For the (O2++Ar+)-ZrO2 thin films it is shown by X-ray photoelectron spectroscopy and Rutherford back scattering that a certain amount of incorporated Ar (5–6 at.%) remains incorporated within the oxide lattice. No changes were detected in the amount of incorporated Ar even after annealing at T=773 K. For higher annealing temperatures (T>1073 K), the amount of Ar starts to decrease, and at T=1223 K only residual amounts of Ar (<0.4%) remain within the lattice. It has been found that as far as Ar atoms remain incorporated within the ZrO2 network, the (O2+–Ar+)-ZrO2 films present a cubic/tetragonal phase. When the amount of “embedded” Ar decreases, the crystalline phase reverts to monoclinic, the majority phase observed for the (O2+)-ZrO2 films after any annealing treatments. The microstructure of the films after different annealing treatments has been investigated by PBA. The presence of Ar ions and the initial amorphous state of the layers were detected by this technique. An increase of the open volume was observed after annealing up to 773 K in both sets of samples. For higher annealing temperatures the samples showed a progressive crystallisation resulting in a decrease of the open volume. During this sintering the samples without embedded Ar present a higher concentration of open volume defects. After the release of Ar occurs (T⩾1223 K) both samples approach to a similar defect free state. The incorporation of Ar within the ZrO2 thin film structure, is proposed as the main factor contributing to the stabilisation of the cubic/tetragonal phase of ZrO2 at room temperature.

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Structural effects due to the incorporation of Ar atoms in the lattice of ZrO2 thin films prepared by ion beam assisted deposition

Author: Holgado, J.P.; Escobar-Galindo, Ramón; Veen, A. van; Schut, Henk; Hosson, J.Th.M. de; González Elipe, Agustín Rodríguez
Publisher: ScienceDirect
Year: 2002
DOI: 10.1016/S0168-583X(02)00695-X
Source: https://idus.us.es/bitstreams/7ebb72c5-f521-4988-8a88-c1020c2adb63/download
S uc u al effec s due o he inco po a ion o A a oms
in he la ice o Z O2 hin films p epa ed by ion beam
assis ed deposi ion
J.P. Holgado
a
, R. Escoba Galindo
b
, A. an Veen
b
, H. Schu
b
,
J.Th.M. de Hosson
c
, A.R. Gonz
aalez-Elipe
a,*
a
Ins i u o de Ciencia de Ma e iales de Se illa (CSIC/Uni e sidad de Se illa) and Dp o. de Qu
ıımica, Ino g
aanica Uni . Se illa.,
A . Ame ico Vespucio S/N, E-41092 Se illa, Spain
b
In e acul y Reac o Ins i u e, De ec s in Ma e ials, Del Uni e si y o Technology, Mekelweg 15, 2629 JB Del , The Ne he lands
c
Ma e ials Science Cen e , Uni e si y o G oningen, Nijenbo gh 4, 9747 AG G oningen, The Ne he lands
Recei ed 4 Oc obe 2001; ecei ed in e ised o m 27 Janua y 2002
Abs ac
Two se s o Z O2 hin films ha e been p epa ed a oom empe a u e by ion beam induced chemical apou de-
posi ion and subsequen ly annealed up o 1323 K. The wo se s o samples ha e been p epa ed by using ei he Oþ
2o
mix u es o (Oþ
2þA þ) ions o he decomposi ion o a ola ile me allo ganic p ecu so o zi conium. The s uc u e
and mic os uc u e o hese wo se s o samples ha e been de e mined by means o X- ay diff ac ion, Fou ie ans o m
in a ed spec oscopy and posi on beam analysis (PBA). The samples we e e y compac and dense and had a e y
low-su ace oughness. A e annealing in ai a TP573 K bo h se s o films we e anspa en and showed simila
e ac ion indexes.
Fo he (Oþ
2þA þ)-Z O2 hin films i is shown by X- ay pho oelec on spec oscopy and Ru he o d back sca e ing
ha a ce ain amoun o inco po a ed A (5–6 a .%) emains inco po a ed wi hin he oxide la ice. No changes we e
de ec ed in he amoun o inco po a ed A e en a e annealing a T¼773 K. Fo highe annealing empe a u es
(T>1073 K), he amoun o A s a s o dec ease, and a T¼1223 K only esidual amoun s o A (<0.4%) emain
wi hin he la ice. I has been ound ha as a as A a oms emain inco po a ed wi hin he Z O2ne wo k, he
(Oþ
2
–A þ)-Z O2films p esen a cubic/ e agonal phase. When he amoun o ‘‘embedded’’ A dec eases, he c ys alline
phase e e s o monoclinic, he majo i y phase obse ed o he (Oþ
2)-Z O2films a e any annealing ea men s.
The mic os uc u e o he films a e diffe en annealing ea men s has been in es iga ed by PBA. The p esence o
A ions and he ini ial amo phous s a e o he laye s we e de ec ed by his echnique. An inc ease o he open olume
was obse ed a e annealing up o 773 K in bo h se s o samples. Fo highe annealing empe a u es he samples
showed a p og essi e c ys allisa ion esul ing in a dec ease o he open olume. Du ing his sin e ing he samples
wi hou embedded A p esen a highe concen a ion o open olume de ec s. A e he elease o A occu s (TP1223
K) bo h samples app oach o a simila de ec ee s a e.
Nuclea Ins umen s and Me hods in Physics Resea ch B 194 (2002) 333–345
www.else ie .com/loca e/nimb
*
Co esponding au ho . Fax: +34-954-460-665.
E-mail add ess: [email p o ec ed] (A.R. Gonz
aalez-Elipe).
0168-583X/02/$ - see on ma e Ó2002 Else ie Science B.V. All igh s ese ed.
PII: S0168-583X(02)00695-X
The inco po a ion o A wi hin he Z O2 hin film s uc u e, is p oposed as he main ac o con ibu ing o he
s abilisa ion o he cubic/ e agonal phase o Z O2a oom empe a u e.
Ó2002 Else ie Science B.V. All igh s ese ed.
Keywo ds: Chemical apou deposi ion; Ion bomba dmen ; Thin film; Posi on annihila ion; Phase ans o ma ion; Ion assis ed
deposi ion; Z O2
1. In oduc ion
Among many o he applica ions, such as op i-
cal coa ings [1], buffe laye s o g owing supe -
conduc o s [2], hea esis an coa ings [3], oxygen
senso s [5], e c. ... , Z O2 hin films ha e a ac ed
g ea a en ion because o hei p ope ies as ion
conduc o s [4], o be used in he so-called solid
oxide uel cells (SOFCs) [5]. Fo all hese appli-
ca ions, and specially in he case o SOFCs, i is
gene ally desi able o ob ain he e agonal o
cubic phase o zi conia. I is known ha al hough
he e agonal phase o Z O2is uns able a oom
empe a u e, i can be s abilised by doping wi h
ca ions such as Y3þ,Ca
2þ, e c. [6], o by dec easing
he pa icle size o he c ys alline domains [7]. The
syn hesis o Z O2o Z O2doped hin films (i.e.
Z O2-M) has been a emp ed by many diffe en
me hods including sp ay deposi ion [8], chemical
apou deposi ion (CVD) [9], elec on e apo a ion
[10], and o he me hods [11].
Ve y compac Z O2ðMÞ hin films can be p e-
pa ed by ion beam assis ed deposi ion p ocedu es
(IBAD) [12] ha in ol e he bomba dmen o
he g owing film wi h low-ene gy ion beams (i.e.
gene ally EP1000 eV), usually Oþ
2,A
þo mix-
u es o bo h. By hese me hods, i is e y common
o obse e he appea ance o diffe en c ys allo-
g aphic effec s, such as amo phisa ion o he p e -
e en ial g ow h o some c ys allog aphic planes
[13,14] ha a e a ibu ed o he influence o he
bomba dmen wi h low-ene gy ions [15]. Ma in
[16] has shown ha monoclinic o e agonal phase
ans o ma ions can be induced in Z O2 hin films
by bomba dmen wi h A þions o ela i ely low
ene gy. Fo bulk Z O2 he effec o high-ene gy
A þbomba dmen in inducing c ys allog aphic
ans o ma ions and he s abilisa ion o he cubic/
e agonal phase is well known [17]. In mos cases
an implici explana ion o his ype o monoclinic
o cubic/ e agonal ans o ma ion elies on he
assump ion ha ballis ic in e ac ions be ween he
ene ge ic ions and he a ge a oms a e esponsi-
ble o he phase change. The esul s p esen ed
in he p esen pape do no exac ly suppo such
an explana ion based on ene ge ic effec s, bu a-
he emphasise he ole o A embedded wi hin
he Z O2 hin film in p oducing he s abilisa ion
o he cubic/ e agonal phase. We compa e he
s uc u al e olu ion o Z O2 hin films p epa ed
by ion beam induced chemical apou deposi ion
(IBICVD) by using ei he Oþ
2o mixed Oþ
2þA þ
ion beams. In he la e case he cubic/ e agonal
phase is s abilised upon annealing, as long as A
a oms emain inco po a ed wi hin he hin films.
In a p e ious pape [18] we ha e s udied in de ail
how he ex u e, mo phology and op ical p ope -
ies o he esul ing films a e affec ed by he use o
A þions. The fi s mo i a ion o he p esen pa-
pe is hen o highligh how he p esence o in-
co po a ed A may s abilise he cubic/ e agonal
s uc u e o zi conia ac ing in a simila way han
‘‘doping’’ ca ions such as Y3þ,Ca
2þ, e c. and o
p o ide an analysis o he e olu ion o s uc u al
de ec s in he samples upon annealing, as de e -
mined by posi on beam analysis (PBA).
2. Expe imen al
Thin films ha e been p epa ed by IBICVD [19].
This me hod consis s o he decomposi ion o a
ola ile me allic p ecu so by means o an ion
beam. Fu he de ails abou he me hod as applied
o he syn hesis o oxides and ni ides can be ound
in p e ious publica ions [19–21].
Zi conium e a e -bu oxide, Z (Obu )4has
been used as p ecu so . Typical pa ial p essu e
334 J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345
du ing deposi ion was 4 105mba . Oþ
2o mix-
u es o Oþ
2þA þions, accele a ed o 400 eV,
we e supplied by an ‘‘IQP’’ b oad ion sou ce.
O2þA mix u es wi h a mola a io 10:1 we e
used o p epa a ion o A -inco po a ed samples.
A beam cu en o a ound 40 lAcm
2was mea-
su ed a he sample holde du ing deposi ion. The
o al p essu e in he chambe du ing deposi ion
was 5 104mba . Unde hese condi ions a
g ow h a e o app oxima ely 2.0 nm min1was
measu ed wi h a qua z c ys al moni o a he
sample posi ion.
Silicon (1 0 0) wa e s and used qua z ha e
been used as subs a es o p epa a ion o he
samples.
X- ay diff ac ion (XRD) spec a we e eco ded
by using he Cu Ka adia ion wi h a Siemens
D5000 diff ac ome e . An incidence angle o 0.5°
was chosen o inc ease he sensi i i y.
IR spec a we e ob ained wi h a Nicole spec-
ome e a 8 cm1 esolu ion o samples p epa ed
on Si wa e s. The silicon subs a e was pa ially
anspa en o in a ed adia ion showing a small
ea u e a 609 cm1.
Annealing o he samples in ai was ca ied ou
in a con en ional a mosphe ic u nace, using a
linea hea ing amp o 10 K min1. A he end o
he amp he selec ed final empe a u e was kep
o 3 h ollowed by cooling down slowly.
Ru he o d back sca e ing (RBS) spec a we e
eco ded wi h a andem ion accele a o (Pelle on
9SH-2 om NEC) a he Cen o Nacional de
Acele ado es (CNA) in Se ille. Alpha pa icles o
2.021 MeV and usual se ings o sca e ing angle
and de ec o geome y we e used o eco ding o
spec a. The da a acquisi ion was done wi h a o al
sample cha ge o 5 lC. Simula ions o composi-
ion p ofiles ha e been done wi h he RUMP
p og am code [22].
X- ay pho oelec on spec oscopy (XPS) was
ca ied ou using an ESCALAB 210 spec ome e
wo king in pass ene gy cons an mode wi h a alue
o 50 eV. The su ace concen a ion o he ele-
men s was de e mined by measu ing he peak
a eas and co ec ing by he app op ia e sensi i i y
alues.
The PBA was pe o med using he Del a i-
able ene gy posi on beam (VEP) [23]. The posi-
ons we e injec ed in he samples wi h ene gies
be ween 100 eV and 25 keV. Annihila ion o pos-
i ons wi h elec ons esul s, in he cen e -o -mass
sys em, in he emision o wo collinea pho ons o
511 keV each. In he labo a o y ame he non-
ze o momen um o he posi on-elec on pai
causes an ene gy shi o he pho ons. This esul s
in a b oade ene gy dis ibu ion, called Dopple
b oadening o he annihila ion adia ion (DBAR)
a ound he 511 keV peak. This b oadened ene gy
spec um is cha ac e ised by wo pa ame e s: S
and W. The S(shape) pa ame e is defined as he
a io be ween he cen al a ea and he o al a ea o
he annihila ion pho opeak. This pa ame e e-
flec s he annihila ion o posi ons wi h alence
elec ons (low-momen um elec ons). In gene al, a
high alue o Sindica es posi on annihila ion in
open olume de ec s. I he ma e ial allows he
o ma ion o a Posi onium s a e (Ps) his will
con ibu e o he DBAR wi h a na ow componen
because o he low-in insic momen o he pa a-
posi onium. A second use ul pa ame e o he
analysis o DBAR is he W(wing) pa ame e ,
which eflec s he posi on annihila ion wi h high-
momen um elec ons (co e elec ons). The W-
pa ame e is sensi i e o changes in he chemical
en i onmen . Bo h pa ame e s can be combined in
S–W maps wi h a hi d a iable (e.g. he implan-
a ion ene gy, empe a u e o s ain) as a unning
pa ame e . These maps a e use ul o ace posi on
apping in, e.g., laye s as in he samples desc ibed
in his wo k. The da a was analysed wi h he
a iable ene gy posi on fi (VEPFIT) p og am
[24]. The samples s udied he e a e modelled by a
numbe o s acked slabs. Each o hese slabs is
cha ac e ised by a hickness (di), Siand Wipa-
ame e s, and a posi on diffusion leng h (Li). The
measu ed SðEÞand WðEÞas a unc ion o he
implan a ion ene gy E, a e a sum o he cha ac-
e is ic Siand Wi alues o he apping laye s
(clus e poin s) weigh ed by he ac ion o posi-
ons apped in each laye iðEÞ. The spec a we e
eco ded wi h a single Ge solid-s a e de ec o . All
expe imen s we e ca ied ou a oom empe a u e
unde a acuum o abou 106Pa. The alues o S
and Wpa ame e s a e no malised wi h espec o
he Sand W alues o a c ys al Si subs a e
(SSi ¼0:58, WSi ¼0:031).
J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345 335
3. Resul s
3.1. Chemical composi ion
The de e mina ion o he chemical composi ion
o he zi conia films was done by XPS and RBS.
The pho oelec on spec a o bo h se o samples,
p epa ed by using Oþ
2o (Oþ
2þA þ) ions, we e
ypical o a Z O2s oichiome y. Besides a ca bon
peak, which is easily emo ed by bomba dmen
wi h A þo Oþ
2(and hus p o ing ha i is due o
con amina ion by exposu e o ai ), no o he con-
aminan species we e de ec ed a he su ace o
samples. In he case o (Oþ
2þA þ)-Z O2samples,
A 2p and A 2s peaks could be de ec ed in he
pho oelec on spec a o he films. Thei in ensi ies
we e equi alen o an a omic pe cen age o ap-
p oxima ely 5–6%, a alue ha did no change
a e cleaning by spu e ing wi h Oþ
2ions o 3 keV
ene gy. The samples we e also analysed by RBS o
ob ain a mo e p ecise quan i a i e de e mina ion
o he amoun o A p esen in he samples, as well
as an e alua ion o he chemical composi ion
p ofile o he whole film hickness. Fig. 1 shows
expe imen al and heo e ically calcula ed spec a
o he as p epa ed (Oþ
2þA þ)-Z O2and Oþ
2-
Z O2samples. The igh o his figu e shows, in an
enla ged scale, he A egion o some spec a
co esponding o (Oþ
2þA þ)-Z O2samples an-
nealed a inc easing empe a u es up o 1423 K. In
he (Oþ
2)-Z O2and (Oþ
2
–A þ)-Z O2samples he O/
Z a io was close o 2.0, al hough a sligh ly
smalle a io (i.e. ffi1.95–2.00) was ob ained o he
as p epa ed (Oþ
2
–A þ)-Z O2 hin film. Fo hese
samples, A (5–6 a .%) is ound o be dis ibu ed
homogeneously o e he whole film hickness e en
a e hei annealing a empe a u es as high as 873
K. A e annealing o he samples a T>773 K
he concen a ion o A wi hin he film dec eases.
I is ound ha a 1073 K only 3% o A is s ill
e ained by he hin film, and ha a smalle con-
cen a ion is obse ed a i s su ace. A e an-
nealing a 1323 K, only a 0.5 a .% o A is p esen ,
wi h an e en lowe concen a ion a he su ace o
he hin film. These esul s indica e ha annealing
ea men s abo e 1073 K p o oke a p og essi e
loss o he A inco po a ed wi hin he s uc u e o
zi conia films. This loss is mo e p onounced
om he opmos su ace laye s o he Z O2 hin
films.
Fig. 1. Expe imen al and simula ed RBS spec a o he (Oþ
2þA þ)-Z O2sample. The inse shows, in an enla ged scale, he egion
co esponding o embedded A a e annealing ea men s a indica ed empe a u es.
336 J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345
3.2. C ys allog aphic s uc u e
Fig. 2 shows XRD pa e ns o (Oþ
2)-Z O2 hin
films p epa ed a 298 K and a e annealing a
inc easingly highe empe a u es up o 1323 K.
Fo compa ison, he e e ence pa e ns o he
mos in ense peaks o he diffe en phases o zi -
conia a e included in he op pa o he figu e. The
spec um o he as p epa ed (Oþ
2)-Z O2sample
e eal he exis ence o a leas wo phases: mono-
clinic and cubic and/o e agonal. I should be
ema ked he e ha he diff ac og ams co e-
sponding o hese wo phases p esen a se ies o
peaks wi h e y simila in ensi y and wi h e y
close posi ions. Due o he la ge wid h o he peaks
ob ained in he diag am o he hin film and he
possible displacemen o he posi ions o he peaks
espec o hose o he pu e phases due o s ess
and s ain effec s, e en a ca e ul analysis o he
posi ions o he peaks do no pe mi o disc imi-
na e be ween he cubic and/o he e agonal phase
o zi conia in he hin film. Thus, in he ollow-
ing discussion a men ion o cubic/ e agonal
phase should always be aken as a possible exis-
ence o any o hose phases o a mix u e o bo h.
Annealing a T<773 K leads o a ela i e in-
c ease o he monoclinic phase, al hough only a
small change in he wid h o he peaks is obse ed
in his ange o empe a u es. By con as , when
he samples a e annealed a highe empe a u es
(T>873 K), a d as ic dec ease is obse ed in he
in ensi y o he peaks associa ed wi h he cubic/
e agonal phase. These peaks p ac ically disap-
pea om he spec um when he film was an-
nealed a TP1223 K. This annealing ea men
induces an inc ease in he heigh and a dec ease in
he wid h o he peaks co esponding o he
monoclinic phase (Table 1). Fo he whole em-
pe a u e ange o annealing, he ela i e in ensi y
o he peaks o he monoclinic phase was a om
he a io obse ed in a single c ys al, hus indi-
ca ing he p e e en ial g ow h in he films o some
c ys allog aphic planes (c . Table 1).
XRD pa e ns o (Oþ
2þA þ)-Z O2films p e-
pa ed a 298K and subsequen ly annealed a in-
c easingly highe empe a u es up o 1323 K a e
p esen ed in Fig. 3. The XRD pa e n o he ‘‘as
deposi ed’’ (Oþ
2þA þ)-Z O2films depic s only wo
b oad ea u es a diff ac ion angles which sugges
he exis ence o a badly o de ed cubic o e agonal
s uc u e o Z O2. Again, he wid h o he peaks
makes i e y difficul o disc imina e be ween hese
wo phases, and in he ollowing discussion i
should always be kep in mind he possible exis-
ence o ei he cubic/ e agonal phases o e en a
mix u e o bo h. Al hough he posi ion o he di -
ac ion lines is consis en wi h hose o he cubic/
e agonal phases, he obse ed in ensi ies a e a
Fig. 2. XRD pa e ns o Oþ
2-Z O2 hin film o he as p epa ed
samples and a e annealing ea men s a indica ed empe a-
u es. The pa e ns o he mos in ense peaks o monoclinic
(bo om), cubic ( op, ull line) and e agonal ( op, dashed line)
phases o zi conia a e included o compa ison.
J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345 337

om e e ence pa e ns. In pa icula , he high in-
ensi y o he peak a 2hffi59:4°, indica es a p e -
e en ial g ow h o he film acco ding o he
co esponding (3 1 1) planes o he cubic phase and/
o he (2 1 1) plane o he e agonal phase. The
p e e en ial g ow h o planes wi h high Mille in-
dices has been ecen ly epo ed by us o Fe2O3
hin films p epa ed also by IBICVD [25]. Such a
p e e en ial g ow h was ela ed wi h he p esence
o A embedded in he s uc u e.
By annealing hese zi conia samples a TP573
K he diff ac ion pa e n changed. The maximum
o he peak a 2h¼59:4°becomes sligh ly b oade
wi h a small asymme y a highe diff ac ion an-
gles. Simul aneously, a b oad ea u e appea s a
2h¼33–35°. The compa ison o hese s uc u es
wi h he lines co esponding o he e e ence pa -
e n o he bulk ma e ial, sugges s he exis ence o
a badly o de ed cubic/ e agonal phase o zi conia
in he as p epa ed samples and hei p og essi e
o de ing o es uc u ing wi h he annealing
ea men s.
A significan change in he diff ac ion diag am
o he (O2þA þ)-Z O2samples is obse ed a e
annealing a T¼1073 K. In his case he peak
co esponding o planes (3 1 1) is s ill he mos
in ense, bu becomes na owe (c . Table 2). In his
diag am peaks a 33–35°a e now clea ly isible,
p obably co esponding o some diff ac ion planes
o he cubic/ e agonal phase o zi conia and/o
(2 0 0) o he monoclinic phase. The peaks o he
e agonal/cubic phases o he zi conia a e no
longe isible a e annealing a T¼1223 K, being
subs i u ed by a clea pa e n co esponding o he
monoclinic phase. The diff ac ion peaks o his
phase a e also much na owe now (c . Table 2),
ha ing a ull wid h a hal maximum (FWHM)
simila o ha o he peaks o he (Oþ
2)-Z O2 hin
films epo ed in Fig. 2 (c . Table 1). A e an-
nealing a 1323 K, a diff ac ion diag am simila o
ha depic ed by he Oþ
2-Z O2sample annealed a
he same empe a u e was ob ained.
Fou ie ans o m in a ed spec oscopy
(FTIR) spec oscopy can be used as a complemen
o XRD o a mo e accu a e desc ip ion o he
s uc u e o Z O2 hin films. Al hough FTIR is
no mally used on a ‘‘finge p in ’’ basis, a sys em-
a ic analysis o IR spec a may also p o ide insigh
in o he Z O2 hin film s uc u e [25–29].
Fig. 4 shows FTIR spec a o he (Oþ
2)-Z O2
sample as p epa ed and a e diffe en annealing
ea men s up o 1323 K. Ini ially, he FTIR
spec a o he as p epa ed Oþ
2-Z O2film is cha -
ac e ised by a s uc u e whe e some b oad bands
a e defined a 340, 407 and 490 cm1. These
bands can be a ibu ed o some o he 15 ib a-
ional modes o he monoclinic phase o Z O2[30].
By annealing a T6773 K, he bands become
sligh ly sha pe and inc ease in in ensi y. This
endency is e en clea e a e annealing TP1223
K, while some new bands cen ed a 258, 460 and
570 cm1de elop in he spec um. These bands
can be also assigned o some o he 15 ib a ional
modes o he monoclinic phase o Z O2[30]. The
inc ease in in ensi y a TP1073K, he de elop-
men o new bands and he smalle wid h o he
obse ed bands abo e his empe a u e a e ac s
which a e consis en wi h he obse ed inc ease in
he c ys allini y o he monoclinic phase. This
endency can be also deduced om he dec ease o
Table 1
No malised in ensi y, e e ed o mos in ense peak o each phase and FWHM (in b acke s) o he mos significan peaks appea ing in
XRD diag ams o Fig. 2 o (Oþ
2)-Z O2samples a e indica ed annealing ea men s
Tempe a u e
Monoclinic Cubic/ e agonal
(1 1 0) (1 1 1) (1 1 1) (1 1 1) (2 2 0) (3 1 1)
300 K 18 (0.98) 18 (0.90) 100 (0.82) 100 (0.92) – –
573 K 19 (0.85) 45 (0.83) 100 (0.82) 100 (0.88) – –
773 K 21 (0.75) 58 (0.75) 100 (0.62) 100 (0.81) – –
1073 K 14 (0.72) 58 (0.57) 100 (0.39) 100 (0.40) – –
1223 K 18 (0.32) 21 (0.32) 100 (0.26) – – –
1323 K 25 (0.25) 63 (0.29) 100 (0.23) – – –
Single c ys al 25 100 70 100 50 20
338 J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345
he FWHM o he peaks o he XRD diag ams
p esen ed in Fig. 2 (c . Table 1).
Fig. 5 shows he FTIR spec a co esponding o
a(O
þ
2þA þ)-Z O2sample subjec ed o diffe en
annealing ea men s. The as p epa ed sample
p esen s only a wide s uc u e wi h a maximum a
399 cm1. A e annealing a T6773 K, his
s uc u e becomes sligh ly sha pe and wo max-
ima can be obse ed a 343 and 434 cm1. To ou
knowledge ypical equencies o he ans e se
ib a ional modes o he cubic o e agonal pha-
ses o pu e Z O2a e no epo ed in li e a u e.
The e o e, compa ison is made wi h he ib a-
ional equencies o he cubic and e agonal
phases o Y ia-s abilised Z O2[31] epo ed in
Table 3. Assuming ha he p esence o y ia
migh p oduce some shi s in he posi ion o
bands, he spec a in Fig. 5 a e annealing a
TP573 K could be consis en wi h he o ma ion
o he e agonal phase. By con as , he b oad
band a 399 cm1 ound in he as p epa ed
sample, could be a ibu ed o a badly o de ed
cubic and/o e agonal phase. The b oad shapes
o all hese spec a make i difficul o disca d some
mino i y con ibu ion o a cubic phase a e an-
nealing a 573 o 773 K. The FTIR spec a o he
(Oþ
2þA þ)-Z O2samples annealed a TP1073 K
unde go d as ic changes. The shape o spec a is
be e defined, and shows bands cen ed a 330,
405 and 490 cm1. The posi ion o hese new bands
is simila o hose ha we e asc ibed o he
monoclinic phase o zi conia obse ed in he (Oþ
2)-
Z O2samples. Howe e , he supe posi ion o he
b oad IR s uc u e o he e agonal phase canno
be disca ded in hese spec a. I is in e es ing ha
no clea e idence o he p esence o he monoclinic
phase can be deduced om he XRD pa e n only
o he (Oþ
2þA þ)-Z O2sample annealed a his
empe a u e (c . Fig. 2). The diffe en long ange
o de sensi i i y o XRD and IR is likely he ea-
son o he diffe en in o ma ion p o ided by hese
wo echniques and indica e he ad an age o using
bo h me hods o a p ope e alua ion o he
s uc u e o some hin films. A e annealing a
T¼1323 K, he bands inc ease in in ensi y and
become be e defined, while some o he bands a
258, 340, 407, 460, 490 and 570 cm1become
also isible. A his final empe a u e, he spec um
is almos iden ical o ha ob ained o he (Oþ
2)-
Z O2sample annealed a he same empe a u e.
3.3. Posi on annihila ion expe imen s
The S-pa ame e e sus implan a ion ene gy in
he as p epa ed samples o (Oþ
2þA þ)-Z O2and
(Oþ
2)-Z O2se ies is plo ed in Fig. 6(a). Bo h
samples p esen almos iden ical a ia ion o his
Fig. 3. XRD pa e ns o (Oþ
2þA þ)-Z O2 hin film o he as
p epa ed samples and a e annealing ea men s a indica ed
empe a u es. The pa e ns o he mos in ense peaks o
monoclinic (bo om), cubic ( op, ull line) and e agonal ( op,
dashed line) phases o zi conia a e included o compa ison.
J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345 339
pa ame e , indica ing ha he ac ion o open
olume in he samples is e y simila . By con as ,
he a ia ion o he W-pa ame e , p esen ed in
Fig. 6(b), shows some diffe ences be ween he as
p epa ed samples o (Oþ
2þA þ)-Z O2and (Oþ
2)-
Z O2. In p inciple, his change can be asc ibed o
he posi on annihila ion in he icini y o a gon
ions, as hey a e hea ie han oxygen ions and,
acco dingly, posi on annihila ion wi h i s co e
elec ons would be enhanced.
Fig. 4. FTIR spec a o he (Oþ
2)-Z O2 hin film o he as
p epa ed sample and hose ob ained a e annealing ea men s
a indica ed empe a u es.
Fig. 5. FTIR spec a o he (A þþOþ
2)-Z O2 hin film o he
as p epa ed sample and hose ob ained a e annealing ea -
men s a indica ed empe a u es.
Table 2
No malised in ensi y, e e ed o mos in ense peak o each phase and FWHM (in b acke s) o he mos significan peaks appea ing in
XRD diag ams o Fig. 3 o (A þþOþ
2)-Z O2samples a e indica ed annealing ea men s
Tempe a u e
Monoclinic Cubic/ e agonal
(1 1 0) (1 1 1) (1 1 1) (1 1 1) (2 2 0) (3 1 1)
300K–––––100(2.56)
573K–––––100(2.56)
773K–––––100(2.10)
1073 K –––––100(1.22)
1223 K 18 (0.29) 21 (0.32) 100 (0.26) – – –
1323 K 25 (0.23) 64 (0.29) 100 (0.23) – – –
Single c ys al 25 100 70 100 50 20
340 J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345
Al hough he a ia ion o Sand Wpa ame e s
eflec s he p ope ies o he samples, a simul a-
neous ep esen a ion o hese wo pa ame e s in
S–W plo is usually p e e ed o a clea e desc ip-
ion o he e olu ion o he hin film p ope ies.
Fig. 7 p esen s he S–W map o he as p epa ed
(Oþ
2þA þ)-Z O2and (Oþ
2)-Z O2samples. In his
kind o plo s, in o ma ion is ob ained o he di -
e en laye s o which he sample is composed. In
he cu en s udy a h ee-laye sys em (su ace/
zi conia laye /silicon subs a e) was applied. As
expec ed, he S–W clus e poin s o he su ace and
he silicon subs a e a e iden ical in bo h samples
bu diffe en in hose o he zi conia laye . Thus,
changes in he clus e poin s o he zi conia laye
will eflec changes in he s uc u e o he film. The
a ia ion o he fi ed S–W poin s co esponding
o he zi conia laye o samples o (Oþ
2þA þ)-
Z O2and (Oþ
2)-Z O2a e annealing ea men s a
diffe en empe a u es is shown in Fig. 8. In Fig. 9
he fi ed Sand Wpa ame e s o he zi conia laye
a e plo ed independen ly e sus he annealing
empe a u e. In bo h figu es o he diffe en se s
o samples wo annealing s ages can be conside ed:
annealing om oom empe a u e o 773 K and
annealing abo e ha empe a u e. In he fi s case,
he S–W cha ac e is ic poin s mo e o highe S
alues while he Wpa ame e dec eases. Changes
in he posi on diffusion leng h we e also obse ed.
In ac , o he (Oþ
2)-Z O2samples, he posi on
diffusion leng h inc eases om 7.5 nm in he as
p epa ed sample, o 50 nm a e annealing a 773
K. Fo he as p epa ed (Oþ
2þA þ)-Z O2sample a
sho e posi on diffusion leng h was measu ed
(3 nm) and i emains sho e a e annealing a
Table 3
Some o he IR ib a ional modes o e agonal and Y ia
s abilised cubic Z O2( aken om [30])
Phase mT(cm1)
Te agonal 467
339
Y ia-s abilised cubic 358
Fig. 6. Va ia ion e sus ene gy o implan a ion in he as p e-
pa ed sample o (Oþ
2þA þ)-Z O2and (Oþ
2)-Z O2 hin films (a)
o he S-pa ame e (b) o he W-pa ame e . The lines indica e
he fi ed alues ob ained om VEPFIT.
Fig. 7. S–W plo o he as p epa ed (Oþ
2þA þ)-Z O2and
(Oþ
2)-Z O2as p epa ed, indica ing he h ee-laye sys em (su -
ace/zi conia laye /silicon subs a e). The a ows indica e he
posi on implan a ion dep h.
J.P. Holgado e al. / Nucl. Ins . and Me h. in Phys. Res. B 194 (2002) 333–345 341