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Positron beam analysis of structurally ordered porosity in mesoporous silica thin films

Abstract

Positron beam techniques have been employed to characterise low-k dielectric silica based films, which have two or three dimensional structures of nanometre size pores. Pore fractions vary from 5 to 50%. Positrons implanted in the layer slow down and eventually annihilate with the electrons from the layer. However, in pores of the dielectric films positronium (Ps) is formed before annihilation takes place. The two states of Ps (para-positronium (p-Ps) and ortho-positronium (o-Ps)) are formed with rather different life times of 125 ps and 142 ns, respectively. The behaviour of Ps in the porous material can be described as hot particles with 1 eV initial kinetic energy, which lose their energy by frequent collisions with the atoms of the pore walls. When the pores are interconnected or separated by thin walls allowing permeation of the Ps some of the Ps will effuse from the film into the vacuum. The 2D-ACAR technique enables one to monitor the velocity distribution of the annihilating p-Ps and shows an increasing fraction of surface emitted p-Ps when positrons are implanted closer to the film surface. Measurements of Doppler broadening of 2-gamma annihilation and detection of 3-gamma events (o-Ps) give insight into the frequency of other annihilation events. Combining the results, a complete picture can be obtained of the interactions and transport of the Ps particles in the material. By modelling the Ps behaviour information is obtained on structural parameters of the porous material. A transport model based on multi energy group diffusion of particles describes the results well.

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Positron beam analysis of structurally ordered porosity in mesoporous silica thin films

Author: Veen, A. van; Escobar-Galindo, Ramón; Schut, Henk; Eijt, S.W.H.; Falub, Claudiu V.; Balkenende, A.R.; Theije, Fremke de
Publisher: ScienceDirect
Year: 2003
DOI: 10.1016/S0921-5107(02)00752-3
Source: https://idus.us.es/bitstreams/d266b085-d3df-4214-b4ed-ca5e307c1385/download
Posi on beam analysis o s uc u ally o de ed po osi y in
mesopo ous silica hin ilms
A. an Veen
a,
*, R. Escoba Galindo
a
, H. Schu
a
, S.W.H. Eij
a
, C.V. Falub
a
,
A.R. Balkenende
b
, F.K. de Theije
b
a
De ec s in Ma e ials, In e acul y Reac o Ins i u e, Del Uni e si y o Technology, Mekelweg 15, NL-2629 JB Del , The Ne he lands
b
Philips Resea ch Labo a o ies, P o . Hols laan 4, NL-5656 AA, Eindho en, The Ne he lands
Abs ac
Posi on beam echniques ha e been employed o cha ac e ise low-kdielec ic silica based ilms, which ha e wo o h ee
dimensional s uc u es o nanome e size po es. Po e ac ions a y om 5 o 50%. Posi ons implan ed in he laye slow down and
e en ually annihila e wi h he elec ons om he laye . Howe e , in po es o he dielec ic ilms posi onium (Ps) is o med be o e
annihila ion akes place. The wo s a es o Ps (pa a-posi onium (p-Ps) and o ho-posi onium (o-Ps)) a e o med wi h a he
di e en li e imes o 125 ps and 142 ns, espec i ely. The beha iou o Ps in he po ous ma e ial can be desc ibed as ho pa icles
wi h 1 eV ini ial kine ic ene gy, which lose hei ene gy by equen collisions wi h he a oms o he po e walls. When he po es a e
in e connec ed o sepa a ed by hin walls allowing pe mea ion o he Ps some o he Ps will e use om he ilm in o he acuum.
The 2D-ACAR echnique enables one o moni o he eloci y dis ibu ion o he annihila ing p-Ps and shows an inc easing ac ion
o su ace emi ed p-Ps when posi ons a e implan ed close o he ilm su ace. Measu emen s o Dopple b oadening o 2-gamma
annihila ion and de ec ion o 3-gamma e en s (o-Ps) gi e insigh in o he equency o o he annihila ion e en s. Combining he
esul s, a comple e pic u e can be ob ained o he in e ac ions and anspo o he Ps pa icles in he ma e ial. By modelling he Ps
beha iou in o ma ion is ob ained on s uc u al pa ame e s o he po ous ma e ial. A anspo model based on mul i ene gy g oup
di usion o pa icles desc ibes he esul s well.
#2003 Else ie B.V. All igh s ese ed.
Keywo ds: Posi ons; Posi onium; Annihila ion; Silica; Po es and pe cola ion phenomena
1. In oduc ion
Ma e ials wi h a low dielec ic cons an (kB/2.2) a e
equi ed o u u e gene a ions o ICs, in o de o
subs i u e he p esen dielec ic laye s in ul a la ge scale
in eg a ed (ULSI) de ices. Candida es include, e.g.
o ganic and ino ganic polyme s, and nanopo ous silica.
A high po osi y o he ma e ial is necessa y o lowe he
dielec ic cons an su icien ly. Fu he mo e, po e sizes
should be small ( ypicallyB/5 nm). Cha ac e isa ion o
he po ous s uc u e by a numbe o posi on annihila-
ion echniques [1/4] has shown o be success ul. The
majo i y o posi ons a e implan a ion in he ma e ial
o m posi onium (Ps) in he po es. Since Ps can be
conside ed as a e y ligh ace ‘a om’ wi h he physical
size o a hyd ogen a om wande ing a ound in he po e
s uc u e i can gi e in o ma ion on po e size and
anspo o gas h ough he po ous s uc u e. In his
s udy he emphasis will be on a desc ip ion o he Ps
his o y in low-k hin ilms wi h well-de ined po es. The
expe imen al me hods a e dep h selec i e Dopple
b oadening and high esolu ion 2D-ACAR which mea-
su e momen um dis ibu ions o annihila ing elec on/
posi on pai s and Ps in he ilms. A companion a icle
desc ibes low-k ilms in which he composi ion o he
in e nal su ace is modi ied [5].
2. Sample p epa a ion and expe imen al p ocedu e
The mesopo ous silica samples we e p oduced using
solu ions con aining silicon alkoxides ( e ae hylo ho-
silica e, TEOS) and a su ac an (ce yl ime hylammo-
* Co esponding au ho . Tel.: /31-15-278-2801; ax: /31-15-278-
6422.
E-mail add ess: a [email p o ec ed] .nl (A. an Veen).
Ma e ials Science and Enginee ing B102 (2003) 2/7
www.else ie .com/loca e/mseb
0921-5107/03/$ - see on ma e #2003 Else ie B.V. All igh s ese ed.
doi:10.1016/S0921-5107(02)00752-3
nium b omide, CTAB) o Plu onic F127 (e hylene
oxide)
106
(p opylene oxide)
70
(e hylene oxide)
106
. Du ing
coa ing deposi ion he sol en s e apo a e, micelles a e
o med and he silicon alkoxide condenses o o m
(o ganically modi ied) silica a ound he micelles. A
well-o de ed po e s uc u e is ob ained once he micelles
a e emo ed om he coa ing. The TEOS/CTAB sys em
o ms a high po osi y a h ee dimensional (3D)
hexagonal phase, while he TEOS/F127 sys em esul s
a high po osi y in a wo dimensional (2D) hexagonal
packing o cylinde s in he plane o he su ace. The six
samples used in his s udy a e all hyd ophilic due o he
p esence o silanol g oups a he in e nal po e su aces.
The ilm p ope ies a e gi en in Table 1.
The PBA expe imen s we e pe o med wi h he
posi on beams a he Del Posi on Cen e [6,7]. The
posi ons we e injec ed in he samples wi h ene gies
uned be ween 100 eV and 30 keV. The maximum
implan a ion ene gy co esponds o a ypical implan a-
ion dep h o /2mm in ce amics o densi y 2.5 g cm
3
.
All expe imen s we e ca ied ou a oom empe a u e
unde a acuum o abou 10
6
Pa. The PBA esul s a e
desc ibed in e ms o h ee pa ame e s (S,Wand -Ps)
[8]. The Spa ame e indica es he ac ion o posi ons
ha annihila es wi h low momen um elec ons ( alence
o conduc ion elec ons). This pa ame e is ela ed o
he open olume de ec s p esen in he sample (e.g.
po es). The Wpa ame e indica es he ac ion o
posi ons ha annihila es wi h high momen um elec-
ons (co e elec ons). This pa ame e is ela ed o he
chemical en i onmen whe e he annihila ion akes
place. Bo h pa ame e s can be combined in S/W
maps whe e he di e en annihila ion si es (laye s) can
be dis inguished. The da a was analysed wi h he
VEPFIT
[7] p og am. The hi d pa ame e ( -Ps) ep esen s he
ac ion o implan ed posi ons ha is ela ed o o ho-
posi onium (o-Ps) sel -annihila ion and is obse ed by
3-gannihila ion. In he companion a icle he b anching
o he posi ons in o di e en s a es is p esen ed [5]. Fo
low-kcoa ings i e annihila ion s a es can be dis in-
guished: pa a-posi onium (p-Ps), o-Ps annihila ion ia
he po e wall, o-Ps sel -annihila ion, posi on annihila-
ion inside he walls sepa a ing he po es, and he
ac ion o Ps ha escapes om he ilm. The ac ion
-Ps is de ined such ha o highly po ous ma e ial wi h
la ge po es -Ps/100%.
The 2D-ACAR me hod [9] measu es he de ia ion
om collinea i y be ween he wo annihila ion pho ons.
This de ia ion is o he o de o a ew milli adians. A
high-in ensi y (10
8
e

s
1
) uneable keV posi on beam
POSH enables dep h-selec i e s udies in he (sub)-
mic ome e ange. 2D-ACAR is measu ing exclusi ely
2-gannihila ion e en s and is able o esol ing p-Ps
annihila ion and o de i e he momen um dis ibu ion
o he annihila ing p-Ps.
3. Resul s
In Fig. 1 he measu ed alues o S,W, and -Ps a e
plo ed e sus he posi on ene gy o he six samples. In
he ou h panel he S/W alues a e plo ed in a so
called S/Wmap. The esul s a e ypical o a hin ilm
on a silicon subs a e. Posi ons en e ing wi h a low
ene gy a e implan ed e y shallowly and p obe he ou e
su ace and, he e o e, yield di e en S,Wpa ame e s
han hose in he ene gy ange 1/4 keV co esponding
o implan a ion wi hin he ilms. Fo ene gies la ge
han 4 keV a g adual ansi ion akes place o annihila-
ion in he subs a e. Fi ing p ocedu es (
VEPFIT
[6])
ha e been applied o de e mine he hickness (by weigh )
o he ilm. This hickness ag ees well wi h he weigh
hickness de i ed om Table 1 (using hickness and
densi y). Cha ac e is ic alues de i ed o Sand Wo
all he ilms a e gi en in Table 1. They a e also indica ed
in he S/Wmap o Fig. 2 o six o he ilms. The Ps
ac ion a ies om e y low o abou 50% o he
in es iga ed hyd ophilic samples. Resul s o hyd opho-
bic ilms in [5] show e en highe alues o 85%. In
gene al, he Ps ac ion inc eases wi h po osi y bu he
ac ion is much highe o he high po osi y F127 wo
dimensional s uc u e wi h la ge diame e cylinde s han
o he CTAB h ee dimensional s uc u e wi h small
diame e po es.
A ypical esul ob ained wi h he 2D-ACAR se up
o he F127 (2c) ilm is shown in Fig. 2. The momen um
Table 1
Desc ip ion o he low-k ilms and measu ed posi on annihila ion pa ame e s
Numbe Desc ip ion Thickness (nm) Po osi y (%) Po e size (nm) Densi y (g cm
3
)S
el. laye
W
el. laye
Ps
1a TEOS/CTAB 0.01
a
R
b
184 10.9 1 (0.5) 2.0 0.954 1.64 0
1b TEOS/CTAB 0.05 R 267 31.0 1 (0.5) 1.5 0.992 1.46 0.12
1c TEOS/CTAB 0.1 3D 338 46.3 1.75 (0.25) 1.2 1.010 1.40 0.12
2a TEOS/ F127 0.0005 R 190 7.4 1 (0.5) 2.0 0.982 1.56 0
2b TEOS/ F127 0.002 R 285 35.0 1 (0.5) 1.4 0.994 1.40 0.08
2c TEOS/ F127 0.005 2D 457 44.7 4.5 (0.5) 1.2 0.994 1.48 0.48
a
Composi ion a io.
b
O de ing: R, andom; 2D, wo dimensional; 3D, h ee dimensional.
A. an Veen e al. / Ma e ials Science and Enginee ing B102 (2003) 2 /73
dis ibu ion o he ilm implan ed wi h 3.5 keV posi ons
shown in Fig. 2a e eals asymme y in he y-di ec ion
(co esponding o he di ec ion ou wa d di ec ed om
he su ace). Appa en ly, he dis ibu ion is composed o
an iso opic and an aniso opic componen . I appea s
ha he la e componen is a cosine momen um
dis ibu ion (Fig. 2b) which can be assigned o p-Ps
pa icles lying o he su ace, like a gas molecule
e using om a hole in a olume con aining a low
densi y Knudsen gas. The iso opic con ibu ion can be
decomposed in o a na ow and a b oad componen . The
na ow componen can be assigned o p-Ps ‘gas’ ha
annihila es inside he po es. In Fig. 3 c oss-sec ions o
he momen um dis ibu ion in xand ydi ec ion a e
displayed o he ilm. Analysis o he momen um
dis ibu ion shows ha he a e age ene gy o he Ps
amoun s o 0.9 eV o shallowly implan ed and o 0.5 eV
o 3.5 keV implan ed posi ons. An a e age momen um
Fig. 1. Posi on annihila ion pa ame e s S,W, and -Ps plo ed as a unc ion o he a e age posi on implan a ion dep h, and an S,Wmap showing
all he S,Wda a. Fo he CTAB-1c ilm he cha ac e is ic annihila ion s a es a e gi en: (1) su ace, (2) po ous ilm, (3) in e ace and (4) Si-subs a e.
Fig. 2. Momen um dis ibu ions measu ed o sample 127 2c.
A. an Veen e al. / Ma e ials Science and Enginee ing B102 (2003) 2 /74
o 10
3
m
o
c co esponds o an a e age Ps kine ic ene gy
o 0.128 eV.
4. Posi onium slowing down and anspo in po ous
SiO
2
The implan a ion p o ile o posi ons can be desc ibed
by he so called Makho p o ile (a de i a i eo a
Gaussian) which is also used o solids wi hou po es [8].
The po osi y is aken in o accoun by using he educed
densi y o he po ous silica in he Makho exp ession.
Posi ons do no slow down in he po es, only in he wall
ma e ial. Ps is o med by combining one o he elec ons
p oduced in he ack o he slowing down posi on wi h
he he malised posi on. The Ps pa icle is a ac ed by
he po es and is c ea ed wi h a kine ic ene gy o abou 1
eV, as ollows om Ps su ace emission o Ps om silica
and om ACAR measu emen s on Ps in xe ogel [10].
Once Ps is o med, wi h he wo s a es p-Ps and o-Ps in a
a io o 1/3, i will beha e as an a om in a Knudsen gas.
The e a e only in e ac ions wi h he walls o he
s uc u e bu no wi h o he Ps. The eason o his is
he sho li e ime o Ps a e age li e imes o sel -
annihila ion a e 125 ps o he p-Ps and 140 ns o o-
Ps, espec i ely, when sel -annihila ion occu s. The
annihila ion o p-Ps yields wo g- ays o abou 511
keV, he sel annihila ion o o-Ps yields h ee g- ays in
he ene gy egion 0/511 keV. Annihila ion o o-Ps is
accele a ed by a pick-o eac ion wi h he walls o he
po es; subsequen ly, annihila ion by wo g- ays occu s.
The anspo and cooling o he Ps can be desc ibed
by app oxima ing he Ps anspo by di usion heo y.
Le c(E,x, ) be he concen a ion o Ps a dep h xwi h
ene gy Ea ime .
A balance equa ion can hen be w i en as ollows:
dc(x;E)
d
D(E)d2c(x;E)
dx21
41
Vn(E) sOc(x;E)1
4
1
Vn(Eƒ) sOc(x;E)I(x)lPsc(x;E)
d
lpick-o c(x;E)
whe e he i s e m a he igh hand side desc ibes he
loss/gain by di usion ( he di usion coe icien Dis E
dependen ), he second e m he loss a e by sca e ing
(E0/E?), wi h inal ene gy E?/E/aa e one collision,
and he hi d e m he g ow h a e by sca e ing (Eƒ0
/
E) wi h ene gy Eƒ/aEa e one collision.
In a collision wi h a oms in he mal mo ion also some
ene gy will be ans e ed om he a om o he Ps;
inally, his will lead o he malisa ion o he Ps. This is
no ye included in he heo y. The ou h e m is he
implan a ion a e which is ze o o EB/E
0
, he i h e m
is he sel annihila ion a e and he six h e m he pick-
o a e (impo an only o o-Ps), wi h d he pick-o
laye in he po es wi h adius .
The di usion coe icien can be desc ibed by D(E)/
1/6l
2
n o 3D o de ed and 1/4l
2
n o 2D o de ed po e
s uc u es, whe e lis he jump dis ance/dis ance
be ween he wo cen es o neighbou ing ca i ies/
2

/l
w
, wi h l
w
he hickness o he wall sepa a ing he
po es. V is he a emp equency, in all di ec ions, o
one Ps p esen in a ca i y olume V/4/3/p/
3
, whe e V1/4
(1/V)n
Ps
O
Owhe e
Ps
is he eloci y o he Ps de i ed
Fig. 3. C oss-sec ions h ough momen um dis ibu ion measu ed by 2D-ACAR. (a) Momen um pe pendicula o he su ace, (b) momen um pa allel
o he su ace.
A. an Veen e al. / Ma e ials Science and Enginee ing B102 (2003) 2 /75
om he ene gy E,n
Ps
/V2eE/m
Ps
, and
O
is he
ac ion o Ps ha is pene a ing h ough he walls o
he ca i y gi en by
O
/O*/O,O* is he open o
anspa en pa o he wall,
s
is he ac ion ha
sca e s o he wall. The ac o 1/ais close o uni y
because m
Ps
is much smalle han he mass o he wall
a oms. I s lowes alue o maximum ene gy ans e , is
1/a/(1/m
Ps
/m
a
)
2
/(1/m
Ps
/m
a
)
2
/(1/4m
Ps
/m
a
). The
ene gy loss o Ps wi h ene gy Edu ing ime D equals
1/4(1/V)n(E)
s
O(collision equency)/D /E/a
The bounda y condi ions a e gi en by e lec ion o Ps
a he silicon subs a e in e ace a x/l:(dc/dx)
x1
/
0. I is assumed ha Ps a he acuum side is emi ed
in o he acuum: c
(x0)
/0. The emission a e is gi en
by D(dc/dx). The ime dependen anspo equa ion is
sol ed nume ically.
5. Discussion
The abo e model applied o an o de ed 2D po e
s uc u e (e.g. 127 2c) yields a wall hickness o 1.8 nm.
The e ec i ep-Ps di usi i y is calcula ed o be 2 cm
2
s
1
, and he di usion leng h is 158 nm i he po e
anspa ency pa ame e
O
/0.2 is aken. I ollows
om he alue o he di usion leng h (o he same o de
as he ilm hickness) ha a signi ican amoun o p-Ps
c ea ed h oughou he ilm will escape om he su ace
du ing i s limi ed li e ime. In [5] i is ound ha o a
sample po osi y /45%, p-Ps e usion is obse ed. I is
e y likely ha when walls ge hinne , i.e. a ew imes
he s uc u al po e size in silica, Ps, which has an
e ec i e, quan um mechanically de e mined, size o
abou 0.8 nm when i is in in e ac ion wi h he silica
s uc u e, will easily pe mea e. Nume ical esul s o
anspo o p-Ps implan ed in such a po ous ilm a e
gi en in Fig. 4. Time dependen ene gy dis ibu ions o
p-Ps a a dep h o 200 nm a e plo ed which show he
e olu ion o he ene gy om 1 eV a /0 o a b oad
s a iona y ene gy dis ibu ion when equilib ium is
es ablished be ween he implan a ion o posi ons and
he annihila ion o p-Ps (a e age li e ime 125 ps). The
bo om igu e shows he s a iona y ene gy dis ibu ions
a a ying dep h. A e age ene gies a e 0.35 eV o he
deep laye s and 0.41 eV o he shallow laye s. The
ene gy dis ibu ions de ia e om he Maxwell/Bol z-
mann dis ibu ion which applies o pa icles in he mal
equilib ium. An impo an eason is ha a any ime ho
Ps is in oduced in o he ilm. I seems ha he ene gy
dis ibu ions can be desc ibed a he well by he sum o
wo Maxwell/Bol zmann dis ibu ions, e.g. one wi h
kT
1
/0.11 eV, and kT
2
/0.6 eV o he dis ibu ion
wi h an a e age ene gy o 0.35 eV (no shown he e).
The abo e model can be applied and used o i he
measu ed ene gy and eloci y dis ibu ions, oge he
wi h he o he pa ame e s measu ed in he posi on
beam expe imen s. The model will yield ac ions o all
annihila ing modes which con ibu e o he Sand W
pa ame e s and he Ps ac ion.
6. Conclusions and inal ema ks
Dep h selec i e posi on annihila ion s udies o low-k
ilms show clea ly ha wi h inc easing po osi y o he
ilms p-Ps c ea ed in he ilm is eme ging om he ilm.
The eloci y dis ibu ion o he e using Ps and he Ps
emaining in he ilm can be de e mined. Cooling o he
Ps is slow and is de e mined by in e ac ion wi h he po e
walls. The p esence o o-Ps indica es ha po es ha e
g own beyond 4 nm size. Dopple b oadening pa a-
me e s and Ps ac ion can be used o de e mine he
Fig. 4. (a) Calcula ed ene gy dis ibu ions du ing slowing down o p-
Ps in mesopo ous silica wi h po es o 5 nm and densi y 1 g cm
3
The
Ps pa icles ha e an ini ial ene gy o 1 eV. The implan a ion o
posi ons is con inuous wi h an ene gy o 3.5 keV a an a e age dep h
o 300 nm. The ene gy dis ibu ion is plo ed a ime in e als o 37.5
ps. A e 500 ps a s a iona y s a e is a ained. (b) S a iona y ene gy
dis ibu ions o di e en dep hs in he ilm. A e age ene gies a e
indica ed. A Maxwell/Bol zmann dis ibu ion is shown wi h simila
a e age ene gy.
A. an Veen e al. / Ma e ials Science and Enginee ing B102 (2003) 2 /76

b anching in o all annihila ion channels which depend
on he po ous s uc u e o he ilm. The model p esen ed
he e will in he u u e be used o pe o m i s o he
b anching a ios.
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