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Impact of Gamma Radiation on Dynamic RDSON Characteristics in AlGaN/GaN Power HEMTs

Martínez, Pedro J.; Maset, Enrique; Martín Holgado, Pedro; Morilla García, Yolanda

Abstract

GaN high-electron-mobility transistors (HEMTs) are promising next-generation devices in the power electronics field which can coexist with silicon semiconductors, mainly in some radiation-intensive environments, such as power space converters, where high frequencies and voltages are also needed. Its wide band gap (WBG), large breakdown electric field, and thermal stability improve actual silicon performances. However, at the moment, GaN HEMT technology suffers from some reliability issues, one of the more relevant of which is the dynamic on-state resistance (RON_dyn) regarding power switching converter applications. In this study, we focused on the drain-to-source on-resistance (RDSON) characteristics under 60Co gamma radiation of two different commercial power GaN HEMT structures. Different bias conditions were applied to both structures during irradiation and some static measurements, such as threshold voltage and leakage currents, were performed. Additionally, dynamic resistance was measured to obtain practical information about device trapping under radiation during switching mode, and how trapping in the device is affected by gamma radiation. The experimental results showed a high dependence on the HEMT structure and the bias condition applied during irradiation. Specifically, a free current collapse structure showed great stability until 3.7 Mrad(Si), unlike the other structure tested, which showed high degradation of the parameters measured. The changes were demonstrated to be due to trapping effects generated or enhanced by gamma radiation. These new results obtained about RON_dyn will help elucidate trap behaviors in switching transistors.

Full text

ma e ials A icle Impac o Gamma Radia ion on Dynamic RDSON Cha ac e is ics in AlGaN/GaN Powe HEMTs Ped o J. Ma ínez 1, En ique Mase 1,* , Ped o Ma ín-Holgado 2, Yolanda Mo illa 2, Da id Gilabe 1and Es eban Sanchis-Kilde s 1 1Depa men Elec onic Enginee ing, Uni e si y o Valencia, 46100 Bu jasso , Spain 2Cen o Nacional de Acele ado es (CNA), Uni e sidad de Se illa, CSIC, JA, 41092 Se illa, Spain *Co espondence: emase @u .es Recei ed: 30 July 2019; Accep ed: 27 Augus 2019; Published: 28 Augus 2019   Abs ac : GaN high-elec on-mobili y ansis o s (HEMTs) a e p omising nex -gene a ion de ices in he powe elec onics ield which can coexis wi h silicon semiconduc o s, mainly in some adia ion-in ensi e en i onmen s, such as powe space con e e s, whe e high equencies and ol ages a e also needed. I s wide band gap (WBG), la ge b eakdown elec ic ield, and he mal s abili y imp o e ac ual silicon pe o mances. Howe e , a he momen , GaN HEMT echnology su e s om some eliabili y issues, one o he mo e ele an o which is he dynamic on-s a e esis ance (R ON_dyn ) ega ding powe swi ching con e e applica ions. In his s udy, we ocused on he d ain- o-sou ce on- esis ance (R DSON ) cha ac e is ics unde 60 Co gamma adia ion o wo di e en comme cial powe GaN HEMT s uc u es. Di e en bias condi ions we e applied o bo h s uc u es du ing i adia ion and some s a ic measu emen s, such as h eshold ol age and leakage cu en s, we e pe o med. Addi ionally, dynamic esis ance was measu ed o ob ain p ac ical in o ma ion abou de ice apping unde adia ion du ing swi ching mode, and how apping in he de ice is a ec ed by gamma adia ion. The expe imen al esul s showed a high dependence on he HEMT s uc u e and he bias condi ion applied du ing i adia ion. Speci ically, a ee cu en collapse s uc u e showed g ea s abili y un il 3.7 M ad(Si), unlike he o he s uc u e es ed, which showed high deg ada ion o he pa ame e s measu ed. The changes we e demons a ed o be due o apping e ec s gene a ed o enhanced by gamma adia ion. These new esul s ob ained abou R ON_dyn will help elucida e ap beha io s in swi ching ansis o s. Keywo ds: high-elec on-mobili y ansis o (HEMT); gallium ni ide (GaN); adia ion ha dness; assu ance es ing; adia ion e ec s; o al ionizing dose (TID) 1. In oduc ion Gallium ni ide (GaN) is a p omising ma e ial o nex -gene a ion powe de ices due o i s wide band gap, which allows a la ge b eakdown elec ic ield and he possibili y o ope a ing unde ha sh en i onmen al condi ions [ 1 – 3 ]. Such cha ac e is ics make hese de ices p omising o space applica ions, whe e empe a u e and adia ion a e key ac o s. Pa icula ly, he de elopmen o new GaN high-elec on-mobili y ansis o s (HEMTs) wi h g ea cha ac e is ics, such as low on- esis ance and pa asi ic capaci ances, allow hem o swi ch a highe equencies wi h high e iciency, making hem a ac i e. The inhe en adia ion ha dness, he capabili y o wi hs and highe b eakdown ol ages, and he highe ope a ing empe a u es will enable his echnology’s use in u u e space applica ions, such as elecommunica ions, Ea h obse a ion, and science missions [4,5]. These p omising ad an ages ha e pushed he esea ch ocus on he eliabili y o GaN de ices unde adia ion condi ions. In space en i onmen s, ene ge ic pa icles which impac semiconduc o de ices lose hei ene gy o ionizing and nonionizing p ocesses while hey a el h ough he de ices. Ma e ials 2019,12, 2760; doi:10.3390/ma12172760 www.mdpi.com/jou nal/ma e ials Ma e ials 2019,12, 2760 2 o 15 The ene gy loss causes he p oduc ion o elec on–hole pai s (ioniza ion) and displaced a oms (displacemen damage). Gamma i adia ion is one o he es s used o e alua e he ha dness o de ices o be used in ae ospace applica ions. Ou main objec i e he e was o s udy he deg ada ion induced by he o al ionizing dose (TID) e ec s o 60 Co γ - ay adia ion on GaN HEMTs. The esponse o gamma i adia ion is complex. Comp on elec ons induced by γ - adia ion c ea e elec on–hole pai s, hus changing he occupancy o aps. Rega ding his opic, many esea ch pape s ha e been published in ecen yea s showing di e en beha io s depending on he dose applied and he s uc u e o he HEMT being i adia ed [ 6 ]. In gene al, HEMTs i adia ed wi h gamma ays exhibi a nega i e h eshold ol age and a ansconduc ance dec ease, which can be explained by he c ea ion o ap s a es h oughou he s uc u e and, in some cases, an inc ease in he wo-dimensional elec on gas (2DEG) shee concen a ion [ 7 , 8 ]. Some au ho s ha e epo ed s ain elaxa ion a low-dose gamma i adia ion, which enhanced he channel mobili y [ 9 , 10 ]. In con as , o he au ho s [ 11 ] ha e epo ed a educ ion o 60% o he d ain cu en a a ound 70 k ad(Si). Thus, he de ec s gene a ed by he γ -i adia ion a e e y sensi i e o he s uc u e, ha ing de ec c ea ion a es dependen on he quali y o he sample and he doping le el. On he o he hand, i is well known ha ano he p oblem ela ed o he GaN HEMT s uc u e is he elec on apping e ec s which dec ease de ice pe o mance [ 12 ], in pa icula , he dynamic on- esis ance (R ON_dyn ) [ 13 ]. This apping educes he cu en ha he de ices can d i e below he de ice’s a ed cu en and could be a ibu ed o a apping e ec in di e en egions inside he de ice. In [ 14 ], i was epo ed ha apping could be a ibu ed o he de ice su ace and bu e laye and ha i was possible o dis inguish be ween bo h. These apping e ec s ha e been shown o be induced by he elec ical ield applied be ween he d ain and he ga e. Addi ionally, i was con i med ha he HEMT s uc u e design is a key ac o ega ding he R ON_dyn . Di e en s a egies can be used o mi iga e he inc ease o R ON_dyn , mainly, he use o a p-GaN egion close o he d ain ha is elec ically connec ed o he d ain edge [15] and he op imiza ion o he de ice bu e laye design [16]. Taking in o accoun he p oblems ega ding he e ec s o γ - adia ion and R ON_dyn , i is necessa y o e alua e he e ec o γ - adia ion on R ON_dyn i GaN HEMTs a e o be se iously conside ed o u u e space applica ions. In ac , in e na ional space agencies, such as he Na ional Ae onau ics and Space Adminis a ion (NASA) and he Eu opean Space Agency (ESA), ha e shown inc easing in e es in e alua ing he de elopmen o GaN de ices. Some es ing ac i i ies ha e been included as pa o a u u e adia ion quali ica ion p ocess o wide band gap de ices, as p esen ed in [17]. Analyzing he ele an li e a u e shows ha some con adic o y esul s ha e been epo ed and he easons o hese di e ences a e no e iden . Fu he mo e, a p e ious s udy epo ed changes in R ON_dyn [ 18 ] wi h low-dose gamma adia ion. The e o e, in his s udy, we in es iga ed no only he s a ic cha ac e is ics bu also he R ON_dyn beha io o wo di e en HEMT s uc u es subjec ed o gamma adia ion un il 3.7 M ad(Si). New esul s on his subjec a e shown in his wo k ela ed o he HEMT s uc u e and he biasing condi ions applied du ing i adia ion. These esul s show ha , depending on he s uc u e and he bias applied, apping can be inc eased (case o nega i e ga e bias) o educed (case o sho ed de ices), which p o ides mo e in o ma ion han p e ious s udies, whe e only s a ic cha ac e iza ion had been done. 2. Ma e ials and Me hods No mally-o comme cial AlGaN/GaN HEMTs on Si wi h a ol age a ing o 600 V we e used o he adia ion expe imen . We chose wo di e en HEMT s uc u es: One was a 600 V p-doped GaN ga e injec ion ansis o (HD-GIT) PGA26E07BA, manu ac u ed by Panasonic, Inc. (Kadoma-shi, Osaka, Japan). The HD-GIT has an addi ional p-GaN egion be ween he ga e and he d ain, in which he holes a e injec ed du ing he o -s a e, compensa ing he elec on apping and a oiding R ON_dyn . The o he was he GS66516T, a 650 V p-GaN ga e wi h a me al insula o laye (MISHEMT), manu ac u ed by GaN Sys ems, Inc. (O awa, ON, Canada). Table 1summa izes he key pa ame e s o he in es iga ed de ices. Ma e ials 2019,12, 2760 3 o 15 Table 1. Pa ame e s o he in es iga ed de ices. Pa ame e Symbol GaN MISHEMT GS66516T p-GaN HEMT PGA26E07BA D ain- o-sou ce b eakdown ol age BVDSS 650 V 600 V Con inuous d ain cu en (Tc =25 ◦C) ID60 A 26 A D ain- o-sou ce on- esis ance (Tj =25 ◦C) RDSON 25 mΩ56 mΩ Inpu capaci ance (1 MHz, 400 V) Ciss 520 pF 405 pF To al ga e cha ge QG12.1 nC 5 nC Fo he TID adia ion expe imen , 12 de ices om each HEMT s uc u e we e used. As shown in Table 2, di e en bias condi ions we e applied du ing i adia ion o e alua e he bias dependence o he TID esponse o he HEMTs. In addi ion, one sample o each de ice ype was selec ed as a e e ence (con ol de ice) o con i m he p ope ope a ion o he measu emen sys em; ha is, hese uni adia ed de ices we e subjec ed only o elec ical measu emen s a e each s ep, wi hou any bias o adia ion condi ions applied. Table 2. Bias condi ions applied du ing he i adia ion es . Condi ion De ice Type Sample Se ial Numbe Uni s Radia ion Ga e Bias 1D ain Bias 1 Con ol MISHEMT Q0 1 No N/A N/A p-GaN HEMT Q25 1 No N/A N/A Sho ed MISHEMT Q11, Q12 2 Yes 0 V 0 V p-GaN HEMT Q23, Q24 2 Yes 0 V 0 V D ain bias MISHEMT Q6–Q10, Q21, Q22 7 Yes 0 V 400 V p-GaN HEMT Q18–Q20 3 Yes 0 V 400 V D ain–ga e bias MISHEMT Q1–Q5 5 Yes −5 V 400 V p-GaN HEMT Q13–Q17 5 Yes −5 V 400 V (1) Bias condi ion du ing he i adia ion exposu e (No Applicable—N/A— o uni adia ed con ol samples). The es campaign was ca ied ou in he CNA-RadLab acili y a he Na ional Cen e o Accele a o s in Se ille, Spain. The gamma i adia ion con ained a 60 Co gamma sou ce wi h associa ed pho on ene gies o 1.17 and 1.33 MeV (mean alue: 1.25 MeV). The selec ed dose a e was 23.742 k ad(Si)/h, which is wi hin he “s anda d a e” window (0.36–180 k ad(Si)/h) o he ESA, acco ding o he TID Tes Me hod [ 19 ]. The dose a e was ob ained by measu ing he cha ge wi h wo TM30013 ioniza ion chambe s (PTW-FREIBURG, Ge many) and one mul ichannel elec ome e , Mul iDOS (PTW-FREIBURG, Ge many), and also conside ing he en i onmen al co ec ion ac o . The dose a e uni o mi y in he il e box was 98.5%. The de ices unde es (DUTs) we e moun ed on a p in ed ci cui boa d which was placed in o a 12 × 17 cm il e box o be subjec ed o adia ion, in compliance wi h he Eu opean Space Componen s Coo dina ion Basic Speci ica ion No. 22900 [ 19 ]. This con aine had 2 mm o aluminum and 1.5 mm o lead in he ou e laye and a 5 mm on co e o polyme hyl me hac yla e (PMMA) o achie e he cha ged-pa icle equilib ium. Six i adia ion s eps we e ca ied ou du ing he campaign. Pos -i adia ion elec ical measu emen s we e pe o med a e each exposu e s ep o all he de ices, including he con ol de ices. A he end o o al i adia ion, wo annealing s eps we e implemen ed. The i s s ep consis ed o oom- empe a u e annealing unde bias o 24 h. A e wa ds, accele a ed aging was ca ied ou , Ma e ials 2019,12, 2760 4 o 15 whe e he de ices we e baked a 100 ± 5 ◦ C unde bias o 168 h. In bo h annealing s eps he bias ol age applied on each DUT was he same as ha du ing he i adia ion s eps. Conce ning he measu emen s, wo ypes we e pe o med: I–V measu emen s we e done wi h a Keysigh Powe De ice Analyze B1505A (San a Rosa, CA, USA), and o he R ON_dyn measu emen s, a cus om ci cui (Figu e 1) was implemen ed [20]. Ma e ials 2019, 12, x FOR PEER REVIEW 4 o 15 Conce ning he measu emen s, wo ypes we e pe o med: I–V measu emen s we e done wi h a Keysigh Powe De ice Analyze B1505A (San a Rosa, CA, USA), and o he RON_dyn measu emen s, a cus om ci cui (Figu e 1) was implemen ed [20]. The implemen ed swi ching ci cui had he bene i o ully con olling he ime ha he ol age s ess was applied o he GaN HEMT. Basically, i consis ed o wo ansis o s connec ed in se ies be ween he d ain and he sou ce, wi h a esis i e load be ween bo h o hem. T ansis o Q1 was used o con ol he s ess/ apping ime. A esis i e load Rload was used o se he cu en le el when DUT was in on-s a e. Due o he inhe en pa asi ic induc ance (Lp) o he powe Rload, wo SiC diodes (C4D05120)—D1 and D2—o e ed a eewheeling pa h o he cu en when ei he Q1 o DUT was swi ched om on o o . Figu e 1. Ci cui diag am used o measu e RON_dyn. Fo he ansis o Q1, a SiC MOSFET (C3M0065090) (Wol speed, Du ham, NC, USA) was used in o de o ha e a low ou pu capaci ance (CDS) and low cu en peaks due he cha ge and discha ge o his pa asi ic capaci ance. The alues o he d ain- o-sou ce on- esis ance (RDSON) o he DUT we e ob ained by measu ing he de ice on-s a e ol age (VDSON) ac oss i and di iding by he cu en (IDS) h ough he DUT. The d ain cu en was measu ed using a coaxial shun esis o o 98 mΩ (SDN-414- 10), and o he VDS, a 300 V and 500 MHz passi e ol age p obe was selec ed. Due o he high ol age applied o he DUT, he ol age ac oss i ep esen s a la ge dynamic ange inpu signal o he oscilloscope inpu ampli ie acquisi ions, which can be o e loaded, and as a esul , an accu a e de e mina ion o he on-s a e ol age would no be achie able. To a oid ha p oblem, a ol age clamp ci cui oge he wi h he passi e ol age p obe was used. In pa icula , he ol age clamp used was he comme cial clp1500V15A1 om Sp ingbu o GmbH Emmendingen, Baden-Wu embe g, Ge many). The low ange (2 V) was selec ed in he ol age clippe in o de o ha e a as e esponse—200 ns in his case—conside ing he passi e ol age p obe and he ol age clippe . P ecise equency esponse compensa ion was done in he passi e ol age p obe o make up o he whole chain o he clippe and he ol age p obe. To con ol he “on- ime” o he DUT, a gene ic MOSFET isola ed d i e SI8271BB (Silicon Labs, Aus in, TX, USA) was used. This d i e was selec ed due o he minimum supply ol age needed o 3 V. This low ga e ol age was equi ed o d i e GaN de ices wi h VG = 4 V, which allowed us o see any change in he apping cha ges when measu ing he RON_dyn. This is because, a a highe ga e ol age, he 2DEG densi y a he AlGaN/GaN in e ace is highe , so he de ice is able o d i e low d ain cu en s wi hou being a ec ed by he apped cha ges in he su ace o he bu e . O he wise, i we had used a lowe ga e ol age alue, he densi y o he 2DEG would dec ease and we could see any changes in he RON_dyn due o he apping, e en a low cu en s. Thus, in bo h cases, he apped cha ges a e p esen ; howe e , in he case o he highe ga e ol age, i would equi e highe cu en s o see he e ec by measu ing he RON_dyn. Thus, ins ead o inc easing he cu en , which could induce o he p oblems such as sel -hea ing, which would change he dynamic esponse, we chose o use a lowe ga e ol age o see any changes in he de ice apping. 3. Expe imen al Resul s Figu e 1. Ci cui diag am used o measu e RON_dyn. The implemen ed swi ching ci cui had he bene i o ully con olling he ime ha he ol age s ess was applied o he GaN HEMT. Basically, i consis ed o wo ansis o s connec ed in se ies be ween he d ain and he sou ce, wi h a esis i e load be ween bo h o hem. T ansis o Q1 was used o con ol he s ess/ apping ime. A esis i e load Rload was used o se he cu en le el when DUT was in on-s a e. Due o he inhe en pa asi ic induc ance (L p ) o he powe R load , wo SiC diodes (C4D05120)—D1 and D2—o e ed a eewheeling pa h o he cu en when ei he Q1 o DUT was swi ched om on o o . Fo he ansis o Q1, a SiC MOSFET (C3M0065090) (Wol speed, Du ham, NC, USA) was used in o de o ha e a low ou pu capaci ance (C DS ) and low cu en peaks due he cha ge and discha ge o his pa asi ic capaci ance. The alues o he d ain- o-sou ce on- esis ance (R DSON ) o he DUT we e ob ained by measu ing he de ice on-s a e ol age (V DSON ) ac oss i and di iding by he cu en (I DS ) h ough he DUT. The d ain cu en was measu ed using a coaxial shun esis o o 98 m Ω (SDN-414-10), and o he VDS, a 300 V and 500 MHz passi e ol age p obe was selec ed. Due o he high ol age applied o he DUT, he ol age ac oss i ep esen s a la ge dynamic ange inpu signal o he oscilloscope inpu ampli ie acquisi ions, which can be o e loaded, and as a esul , an accu a e de e mina ion o he on-s a e ol age would no be achie able. To a oid ha p oblem, a ol age clamp ci cui oge he wi h he passi e ol age p obe was used. In pa icula , he ol age clamp used was he comme cial clp1500V15A1 om Sp ingbu o GmbH Emmendingen, Baden-Wu embe g, Ge many). The low ange (2 V) was selec ed in he ol age clippe in o de o ha e a as e esponse—200 ns in his case—conside ing he passi e ol age p obe and he ol age clippe . P ecise equency esponse compensa ion was done in he passi e ol age p obe o make up o he whole chain o he clippe and he ol age p obe. To con ol he “on- ime” o he DUT, a gene ic MOSFET isola ed d i e SI8271BB (Silicon Labs, Aus in, TX, USA) was used. This d i e was selec ed due o he minimum supply ol age needed o 3 V. This low ga e ol age was equi ed o d i e GaN de ices wi h VG=4 V, which allowed us o see any change in he apping cha ges when measu ing he R ON_dyn . This is because, a a highe ga e ol age, he 2DEG densi y a he AlGaN/GaN in e ace is highe , so he de ice is able o d i e low d ain cu en s wi hou being a ec ed by he apped cha ges in he su ace o he bu e . O he wise, i we had used a lowe ga e ol age alue, he densi y o he 2DEG would dec ease and we could see any changes in he R ON_dyn due o he apping, e en a low cu en s. Thus, in bo h cases, he apped cha ges a e p esen ; howe e , in he case o he highe ga e ol age, i would equi e highe cu en s o see he e ec by measu ing he R ON_dyn . Thus, ins ead o inc easing he cu en , which could induce Ma e ials 2019,12, 2760 5 o 15 o he p oblems such as sel -hea ing, which would change he dynamic esponse, we chose o use a lowe ga e ol age o see any changes in he de ice apping. 3. Expe imen al Resul s The e ec o gamma adia ion on bo h es ed s uc u es was di e en . In his sec ion, we analyze he changes o he s a ic and dynamic cha ac e is ics conside ing he e ec s o applied bias condi ions due o he po en ial inc ease o he concen a ion o ac i a ed GaN de ec s [21]. 3.1. T ans e Cha ac e is ics The main elec ical measu emen s add ess he d ain and ga e cu en s, which a e exp essed as a unc ion o he ga e and d ain ol ages. F om he I DS –V GS cha ac e is ics, di e en pa ame e s can be es ablished o p o ide in o ma ion abou he changes su e ed by he GaN HEMTs depending on he adia ion applied. The i s pa ame e analyzed was he h eshold ol age (V TH ), which was ex ac ed by he cu en ex apola ion me hod, whe e he h eshold ol age alue is he V GS alue co esponding o I DS =100 mA wi h a V DS =0.1 V. The h eshold ol age is usually measu ed a lowe cu en s; howe e , ou se up and he limi s de ined o he es (un il 3 A) o ced us o use a highe cu en alue (100 mA) o ha e be e p ecision o h eshold ol age measu emen . Figu e 2shows he a ia ions o he h eshold ol age o all he de ices. I is impo an o highligh he way he esul s a e plo ed, since each de ice had a di e en V TH alue. To p o ide a compa ison, i was necessa y o no malize his alue, di iding he V TH o each de ice a each s ep be ween he co esponding ini ial VTH, measu ed a 0 k ad(Si). Ma e ials 2019, 12, x FOR PEER REVIEW 5 o 15 The e ec o gamma adia ion on bo h es ed s uc u es was di e en . In his sec ion, we analyze he changes o he s a ic and dynamic cha ac e is ics conside ing he e ec s o applied bias condi ions due o he po en ial inc ease o he concen a ion o ac i a ed GaN de ec s [21]. 3.1. T ans e Cha ac e is ics The main elec ical measu emen s add ess he d ain and ga e cu en s, which a e exp essed as a unc ion o he ga e and d ain ol ages. F om he I DS –V GS cha ac e is ics, di e en pa ame e s can be es ablished o p o ide in o ma ion abou he changes su e ed by he GaN HEMTs depending on he adia ion applied. The i s pa ame e analyzed was he h eshold ol age (V TH ), which was ex ac ed by he cu en ex apola ion me hod, whe e he h eshold ol age alue is he V GS alue co esponding o I DS = 100 mA wi h a V DS = 0.1 V. The h eshold ol age is usually measu ed a lowe cu en s; howe e , ou se up and he limi s de ined o he es (un il 3 A) o ced us o use a highe cu en alue (100 mA) o ha e be e p ecision o h eshold ol age measu emen . Figu e 2 shows he a ia ions o he h eshold ol age o all he de ices. I is impo an o highligh he way he esul s a e plo ed, since each de ice had a di e en V TH alue. To p o ide a compa ison, i was necessa y o no malize his alue, di iding he V TH o each de ice a each s ep be ween he co esponding ini ial V TH , measu ed a 0 k ad(Si). The HD-GIT HEMT de ices did no su e any change wi h he accumula ed dose, bu he MISHEMT de ices displayed di e en beha io s depending on he bias applied du ing he i adia ion p ocess. The de ices subjec ed o d ain and ga e ol age du ing i adia ion p esen ed a posi i e inc emen o V TH be ween 5% and 10%, while he de ices s essed only wi h a posi i e ol age a he d ain expe ienced a highe posi i e d i o V TH be ween 10% and 25%. In con as , he de ices subjec ed o adia ion wi h sho ed pins su e ed a nega i e a ia ion o V TH a ound 5–8%. In all cases, once he high- empe a u e annealing s ep o 168 h was inished, all he de ices almos ully eco e ed hei o iginal alues. Figu e 2. No malized h eshold ol age o GaN HEMTs as a unc ion o o al dose. Figu e 2. No malized h eshold ol age o GaN HEMTs as a unc ion o o al dose. The HD-GIT HEMT de ices did no su e any change wi h he accumula ed dose, bu he MISHEMT de ices displayed di e en beha io s depending on he bias applied du ing he i adia ion p ocess. The de ices subjec ed o d ain and ga e ol age du ing i adia ion p esen ed a posi i e inc emen o V TH be ween 5% and 10%, while he de ices s essed only wi h a posi i e ol age a he d ain expe ienced a highe posi i e d i o V TH be ween 10% and 25%. In con as , he de ices subjec ed o adia ion wi h sho ed pins su e ed a nega i e a ia ion o V TH a ound 5–8%. In all cases, Ma e ials 2019,12, 2760 6 o 15 once he high- empe a u e annealing s ep o 168 h was inished, all he de ices almos ully eco e ed hei o iginal alues. This nega i e shi o V TH in de ices sho ed du ing i adia ion and he posi i e shi o he de ices wi h bias applied ma ched wi h he indings epo ed in [ 8 , 22 ]. The nega i e shi was due o he apped holes in he ga e dielec ic o he in e ace wi h AlGaN. The eco e y o V TH du ing he high- empe a u e annealing is explained by he elease o apped holes in he AlGaN laye and/o hei neu aliza ion by elec ons om he channel. Highe empe a u es esul ed in highe hole mobili y, allowing he holes o mig a e o ecombine and, he e o e, educing he hole impac on de ice ope a ion. Meanwhile, du ing i adia ion wi h posi i e bias applied, bo h hole and elec on apping ook place. Howe e , due o he high ol age applied, he elec ons illed he hole aps, and in his way, he elec on aps domina ed in assis ing he posi i e shi o he de ices subjec ed o bias ol age du ing i adia ion. Mo e in o ma ion can be ex ac ed wi h he second pa ame e analyzed, which is he a ia ion o e he ga e cha ac e is ics I GS –V GS (inpu cha ac e is ic), which is a way o e alua e he quali y o he ga e con ac . Figu e 3shows he e olu ion o I GS o e he accumula ed dose o all he de ices measu ed a he maximum ga e ol age applied o 3 V. Ma e ials 2019, 12, x FOR PEER REVIEW 6 o 15 apping ook place. Howe e , due o he high ol age applied, he elec ons illed he hole aps, and in his way, he elec on aps domina ed in assis ing he posi i e shi o he de ices subjec ed o bias ol age du ing i adia ion. Mo e in o ma ion can be ex ac ed wi h he second pa ame e analyzed, which is he a ia ion o e he ga e cha ac e is ics IGS–VGS (inpu cha ac e is ic), which is a way o e alua e he quali y o he ga e con ac . Figu e 3 shows he e olu ion o IGS o e he accumula ed dose o all he de ices measu ed a he maximum ga e ol age applied o 3 V. Figu e 3. No malized o wa d ga e cu en (IGS) o GaN HEMTs as a unc ion o he o al dose measu ed a VGS = 3V. As shown in Figu e 3, he HD-GIT de ices did no su e any changes, while he GaN MISHEMT de ices su e ed a high inc ease in he IGS wi hou dependency on he bias applied du ing i adia ion. This inc ease was p opo ional o he accumula ed dose and independen o he bias condi ion applied. This o wa d ga e cu en did no eco e i s ini ial alue a e he annealing p ocess. Only a sligh eco e y a ound 10% was obse ed o he s essed de ices, while sho ed MISHEMT de ices s ill deg aded a e he high- empe a u e annealing. Inc eases in IGS can be explained by adia ion-induced de ec s on he ga e insula o . The ga e insula o in MISHEMT is used o make no mally o de ices, which deple es he channel while g ea ly educing he ga e cu en . Howe e , he de ec s c ea ed du ing i adia ion educe he e ec i eness o his insula o , and holes can become apped in hese de ec s, hus inc easing he ga e cu en . This also explains he nega i e shi o he h eshold ol age men ioned abo e in he sho ed de ices. Focusing on MISHEMT de ices and measu ing he inc ease o IGS has shown ha he e a e no di e ences due o bias applied, bu one di e ence was de ec ed a his wo k, which is he displacemen o IG–VGS cha ac e is ics wi h he accumula ed dose. In o de o measu e his displacemen , he ga e ol age was measu ed when he ga e cu en c ossed 2 mA, which we e e o as VTH_IG o di e en ia e i om he VTH. In Figu e 4a, blue ma ke s show how his ol age was measu ed, and he no malized alues a e shown in Figu e 4b o all he de ices. This igu e demons a es ha he e is a clea di e ence be ween MISHEMT de ices subjec ed o i adia ion wi h nega i e ga e ol age and he o he MISHEMTs. The e was a signi ican ly la ge nega i e shi in he VTH_IG in he de ices subjec ed o adia ion wi h a nega i e ga e bias. This di e ence can be explained by he addi ional elec on aps c ea ed du ing i adia ion in he egion unde he ga e due o he 0 500 1000 1500 2000 2500 3000 3500 5000 6000 0 2 4 6 8 10 12 14 16 18 Dose (k ad(SiO 2 )) I G /I G @0k ad MISHEMT con ol p-GaN con ol MISHEMT @ 400V DS MISHEMT @ 400V DS A e age MISHEMT @ 400V DS /-5V GS MISHEMT @ 400V DS /-5V GS A e age MISHEMT Sho ed MISHEMT Sho ed A e age p-GaN (All bias) p-GaN (All bias) A e age Ann24h25ºC Ann168h100ºC Figu e 3. No malized o wa d ga e cu en (I GS ) o GaN HEMTs as a unc ion o he o al dose measu ed a VGS =3V. As shown in Figu e 3, he HD-GIT de ices did no su e any changes, while he GaN MISHEMT de ices su e ed a high inc ease in he I GS wi hou dependency on he bias applied du ing i adia ion. This inc ease was p opo ional o he accumula ed dose and independen o he bias condi ion applied. This o wa d ga e cu en did no eco e i s ini ial alue a e he annealing p ocess. Only a sligh eco e y a ound 10% was obse ed o he s essed de ices, while sho ed MISHEMT de ices s ill deg aded a e he high- empe a u e annealing. Inc eases in I GS can be explained by adia ion-induced de ec s on he ga e insula o . The ga e insula o in MISHEMT is used o make no mally o de ices, which deple es he channel while g ea ly educing he ga e cu en . Howe e , he de ec s c ea ed du ing i adia ion educe he e ec i eness o his insula o , and holes can become apped in hese de ec s, hus inc easing he ga e cu en . This also explains he nega i e shi o he h eshold ol age men ioned abo e in he sho ed de ices. Ma e ials 2019,12, 2760 7 o 15 Focusing on MISHEMT de ices and measu ing he inc ease o I GS has shown ha he e a e no di e ences due o bias applied, bu one di e ence was de ec ed a his wo k, which is he displacemen o I G –V GS cha ac e is ics wi h he accumula ed dose. In o de o measu e his displacemen , he ga e ol age was measu ed when he ga e cu en c ossed 2 mA, which we e e o as V TH_IG o di e en ia e i om he V TH . In Figu e 4a, blue ma ke s show how his ol age was measu ed, and he no malized alues a e shown in Figu e 4b o all he de ices. This igu e demons a es ha he e is a clea di e ence be ween MISHEMT de ices subjec ed o i adia ion wi h nega i e ga e ol age and he o he MISHEMTs. The e was a signi ican ly la ge nega i e shi in he V TH_IG in he de ices subjec ed o adia ion wi h a nega i e ga e bias. This di e ence can be explained by he addi ional elec on aps c ea ed du ing i adia ion in he egion unde he ga e due o he educed ba ie heigh s o he aps when nega i e bias was applied a he ga e. This induced an inc ease in he ga e cu en o he low ga e ol ages due o he need o ga e cu en injec ion o emo e he aps. Ma e ials 2019, 12, x FOR PEER REVIEW 7 o 15 as V TH_IG o di e en ia e i om he V TH . In Figu e 4a, blue ma ke s show how his ol age was measu ed, and he no malized alues a e shown in Figu e 4b o all he de ices. This igu e demons a es ha he e is a clea di e ence be ween MISHEMT de ices subjec ed o i adia ion wi h nega i e ga e ol age and he o he MISHEMTs. The e was a signi ican ly la ge nega i e shi in he V TH_IG in he de ices subjec ed o adia ion wi h a nega i e ga e bias. This di e ence can be explained by he addi ional elec on aps c ea ed du ing i adia ion in he egion unde he ga e due o he educed ba ie heigh s o he aps when nega i e bias was applied a he ga e. This induced an inc ease in he ga e cu en o he low ga e ol ages due o he need o ga e cu en injec ion o emo e he aps. (a) (b) Figu e 4. (a) Ga e Scho ky diode cha ac e is ics I GS –V GS (inpu cha ac e is ic) o V DS = 0.1 V. (b) No malized h eshold ol age measu ed o a ga e cu en o 2 μA. 3.2. O -S a e D ain Cu en Measu emen 0123 0 5µ 10µ 15µ 20µ 25µ 30µ 35µ 40µ 45µ 50µ 55µ 60µ 65µ 2 μ A I G (A) V GS (V) Q3-0k ad Q3-300k ad Q3-1259k ad Q3-1710k ad Q3-2166k ad Q3-3697k ad Q3-ann24h25C Q3-ann168h100C V TH_IG measu emen Figu e 4. ( a ) Ga e Scho ky diode cha ac e is ics I GS –V GS (inpu cha ac e is ic) o V DS =0.1 V. ( b ) No malized h eshold ol age measu ed o a ga e cu en o 2 µA. Ma e ials 2019,12, 2760 8 o 15 3.2. O -S a e D ain Cu en Measu emen In each s ep du ing he adia ion es , he d ain- o-sou ce leakage cu en was also measu ed. The alue o he leakage cu en measu ed a 500 V o d ain while he ga e was biased wi h 0 V is shown in Figu e 5. The HD-GIT HEMT i adia ed samples su e ed a small inc ease in he d ain leakage cu en ; con e sely, he GaN MISHEMT de ices expe ienced a much la ge inc ease, which was se en imes highe han i s alue be o e i adia ion. The leakage cu en s be ween he d ain and he sou ce inc eased wi h he accumula ed dose du ing i adia ion. Fu he mo e, hey eco e ed app oxima ely hei ini ial alues a e he high- empe a u e annealing p ocess. This inc ease in leakage cu en ma ched he ga e insula o deg ada ion, which a o ed hole apping due o he educed ba ie heigh o he aps, and i educed he e ec i eness o he channel deple ion. Addi ionally, his inc ease in d ain leakage cu en was lowe in he de ices subjec ed o nega i e ga e ol age du ing i adia ion. This was due o he compensa ion o he hole aps by he exis ence o addi ional elec on aps unde he ga e induced by he nega i e ga e bias du ing adia ion. Ma e ials 2019, 12, x FOR PEER REVIEW 8 o 15 was se en imes highe han i s alue be o e i adia ion. The leakage cu en s be ween he d ain and he sou ce inc eased wi h he accumula ed dose du ing i adia ion. Fu he mo e, hey eco e ed app oxima ely hei ini ial alues a e he high- empe a u e annealing p ocess. This inc ease in leakage cu en ma ched he ga e insula o deg ada ion, which a o ed hole apping due o he educed ba ie heigh o he aps, and i educed he e ec i eness o he channel deple ion. Addi ionally, his inc ease in d ain leakage cu en was lowe in he de ices subjec ed o nega i e ga e ol age du ing i adia ion. This was due o he compensa ion o he hole aps by he exis ence o addi ional elec on aps unde he ga e induced by he nega i e ga e bias du ing adia ion. Figu e 5. No malized d ain- o-sou ce leakage cu en when applying a posi i e ga e ol age o 500 V a he d ain wi h 0 V a he ga e. 3.3. Dynamic Resis ance Measu emen In o de o e alua e he RON_dyn o he de ices subjec ed o adia ion, wo di e en es s we e pe o med: he double-pulse es (DPT) and he mul i-pulse es (MPT). Bo h es s we e conduc ed wi h he ci cui se up shown in Figu e 1, and he d i ing signal es sequence o each es is de ailed in Appendix A. A e he analysis o he esul s ob ained by hese double-pulse measu emen es s, we ound ha o he HD-GIT HEMTs, he e we e no signi ican changes o e he RON_dyn independen o he bias condi ions applied du ing gamma i adia ion. A p oo o one measu ed sample is shown in Figu e 6. Howe e , he GaN MISHEMTs su e ed a change in i s RON_dyn depending on he bias condi ions applied du ing i adia ion. An inc ease was e idenced when he MISHEMT was subjec ed o i adia ion wi h d ain and ga e bias applied simul aneously. As an example o his beha io , he RON_dyn alues o he de ice Q3 a di e en i adia ion and annealing s eps a e shown in Figu e 7. These de ices su e ed an inc ease in RON_dyn p opo ional o he accumula ed dose. The o al accumula ed dose had a deg ada ion e ec on he de ice, which sligh ly inc eased he RDSON, bu a e he annealing p ocess, an e en highe deg ada ion was obse ed in he channel esis ance. 500 1000 1500 2000 2500 3000 3500 5000 6000 0 1 2 3 4 5 6 7 8 9 10 MISHEMT con ol p-GaN con ol MISHEMT @ 400V DS MISHEMT @ 400V DS A e age MISHEMT @ 400V DS /-5V GS MISHEMT @ 400V DS /-5V GS A e age MISHEMT Sho ed MISHEMT Sho ed A e age p-GaN (All bias) p-GaN (All bias) A e age I DSS /I DSS @0k ad Dose (k ad(SiO 2 )) Ann24h25ºC Ann168h100ºC Figu e 5. No malized d ain- o-sou ce leakage cu en when applying a posi i e ga e ol age o 500 V a he d ain wi h 0 V a he ga e. 3.3. Dynamic Resis ance Measu emen In o de o e alua e he R ON_dyn o he de ices subjec ed o adia ion, wo di e en es s we e pe o med: he double-pulse es (DPT) and he mul i-pulse es (MPT). Bo h es s we e conduc ed wi h he ci cui se up shown in Figu e 1, and he d i ing signal es sequence o each es is de ailed in Appendix A. A e he analysis o he esul s ob ained by hese double-pulse measu emen es s, we ound ha o he HD-GIT HEMTs, he e we e no signi ican changes o e he R ON_dyn independen o he bias condi ions applied du ing gamma i adia ion. A p oo o one measu ed sample is shown in Figu e 6. Ma e ials 2019,12, 2760 9 o 15 Ma e ials 2019, 12, x FOR PEER REVIEW 9 o 15 Figu e 6. Dynamic esis ance double-pulse measu emen s a 500 V o p-GaN Q13, subjec ed o d ain and ga e ol age du ing i adia ion. Figu e 7. RON_dyn double-pulse measu emen s a 500 V o GaN MISHEMT Q3 subjec ed o d ain and ga e ol age du ing i adia ion. The inc ease o RON_dyn was highe in he second pulses han in he i s ones. This shows ha apping was induced by ho elec ons du ing he semi-on-s a e in he swi ching e en s. The e o e, applying mo e swi ching pulses would inc ease he RON_dyn. To demons a e his beha io , he mul i- pulse es was pe o med on his de ice. The esul is shown in Figu e 8, e ealing he inc ease o he RON_dyn and p o iding in o ma ion abou di e en apping phenomena. In he p e-i adia ion measu emen , he beha io was an exponen ial inc ease o he RON_dyn ha s a ed a a ol age s ess o a ound 450 V. In he pos -i adia ion measu emen , a new apping beha io occu ed, which had a linea dependence on he ol age applied om 100 o 550 V. 0 100µ 200µ 300µ 400µ 0 50m 100m 150m 200m 250m 300m R DS ( Ω ) Time (s) Q13-0k ad Q13-1877k ad Q13-2626k ad Q13-3697k ad Q13-Ann24h25C Q13-Ann168h100C 0 100µ 200µ 300µ 400µ 0 50m 100m 150m 200m 250m 300m R DS ( Ω ) Ti m e (s) Q3-0k ad Q3-1877k ad Q3-2626k ad Q3-3697k ad Q3-Ann24h25C Q3-Ann168h100C Figu e 6. Dynamic esis ance double-pulse measu emen s a 500 V o p-GaN Q13, subjec ed o d ain and ga e ol age du ing i adia ion. Howe e , he GaN MISHEMTs su e ed a change in i s R ON_dyn depending on he bias condi ions applied du ing i adia ion. An inc ease was e idenced when he MISHEMT was subjec ed o i adia ion wi h d ain and ga e bias applied simul aneously. As an example o his beha io , he RON_dyn alues o he de ice Q3 a di e en i adia ion and annealing s eps a e shown in Figu e 7. These de ices su e ed an inc ease in R ON_dyn p opo ional o he accumula ed dose. The o al accumula ed dose had a deg ada ion e ec on he de ice, which sligh ly inc eased he R DSON , bu a e he annealing p ocess, an e en highe deg ada ion was obse ed in he channel esis ance. Ma e ials 2019, 12, x FOR PEER REVIEW 9 o 15 Figu e 6. Dynamic esis ance double-pulse measu emen s a 500 V o p-GaN Q13, subjec ed o d ain and ga e ol age du ing i adia ion. Figu e 7. RON_dyn double-pulse measu emen s a 500 V o GaN MISHEMT Q3 subjec ed o d ain and ga e ol age du ing i adia ion. The inc ease o RON_dyn was highe in he second pulses han in he i s ones. This shows ha apping was induced by ho elec ons du ing he semi-on-s a e in he swi ching e en s. The e o e, applying mo e swi ching pulses would inc ease he RON_dyn. To demons a e his beha io , he mul i- pulse es was pe o med on his de ice. The esul is shown in Figu e 8, e ealing he inc ease o he RON_dyn and p o iding in o ma ion abou di e en apping phenomena. In he p e-i adia ion measu emen , he beha io was an exponen ial inc ease o he RON_dyn ha s a ed a a ol age s ess o a ound 450 V. In he pos -i adia ion measu emen , a new apping beha io occu ed, which had a linea dependence on he ol age applied om 100 o 550 V. 0 100µ 200µ 300µ 400µ 0 50m 100m 150m 200m 250m 300m R DS ( Ω ) Time (s) Q13-0k ad Q13-1877k ad Q13-2626k ad Q13-3697k ad Q13-Ann24h25C Q13-Ann168h100C 0 100µ 200µ 300µ 400µ 0 50m 100m 150m 200m 250m 300m R DS ( Ω ) Ti m e (s) Q3-0k ad Q3-1877k ad Q3-2626k ad Q3-3697k ad Q3-Ann24h25C Q3-Ann168h100C Figu e 7. R ON_dyn double-pulse measu emen s a 500 V o GaN MISHEMT Q3 subjec ed o d ain and ga e ol age du ing i adia ion. The inc ease o R ON_dyn was highe in he second pulses han in he i s ones. This shows ha apping was induced by ho elec ons du ing he semi-on-s a e in he swi ching e en s. The e o e, applying mo e swi ching pulses would inc ease he R ON_dyn . To demons a e his beha io , he mul i-pulse es was pe o med on his de ice. The esul is shown in Figu e 8, e ealing he inc ease o he R ON_dyn and p o iding in o ma ion abou di e en apping phenomena. In he p e-i adia ion measu emen , he beha io was an exponen ial inc ease o he R ON_dyn ha s a ed a a ol age s ess